The Indonesian Journal of Material Research (IJMR) is currently undergoing a transition in its journal theme and website appearance. This transition is part of our continuous effort to provide a more modern, informative, and reader-friendly platform. The updated website features a more visible and attractive interface , designed to make it easier for readers to explore, search for, and access articles published in IJMR. The new appearance also aims to improve the overall reading experience and provide clearer access to important journal information. During this transition period, some elements of the website may still be undergoing adjustments and improvements. We appreciate your patience and understanding as we continue to develop the platform. We look forward to providing our readers, authors, reviewers, and researchers with a more accessible, engaging, and user-friendly journal experience . Thank you for your continued support of the Indonesian Journal of Material Research.

The Indonesian Journal of Material Research (IJMR) is pleased to announce that Volume 4, Number 2 (July 2026) has been published earlier than scheduled due to the high number of manuscripts submitted to our journal and the completion of the review process for the articles included in this issue. This issue contains 7 selected articles contributed by researchers from several countries, including Indonesia , Vietnam , Taiwan , and India , covering recent developments in material science, nanotechnology, adsorption, crystal engineering, and optoelectronic materials. We sincerely appreciate the contributions and support from all authors, reviewers, and editors for their dedication to IJMR.

We are pleased to announce that Volume 4, No. 1 (March 2026) of our journal has been officially published. This issue features both review and original research articles contributed by authors from Indonesia and Iraq , reflecting our growing international collaboration and academic diversity. We sincerely thank all authors, reviewers, and editorial team members for their valuable contributions and dedication to maintaining the high quality of our publication. We invite researchers, academics, and practitioners to explore the latest issue and share these valuable contributions within the scientific community.